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Lim, Andy Eu-Jin, Fang, Wei-Wei, Liu, Fangyue, Lee, Rinus Tek Po, Samudra, Ganesh, Kwong, Dim-Lee, Yeo, Yee-Chia (2007) Impact of interfacial dipole on effective work function of nickel fully silicided gate electrodes formed on rare-earth-based dielectric interlayers. Applied Physics Letters, 91 (17). 172115pp. doi:10.1063/1.2803762

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Reference TypeJournal (article/letter/editorial)
TitleImpact of interfacial dipole on effective work function of nickel fully silicided gate electrodes formed on rare-earth-based dielectric interlayers
JournalApplied Physics Letters
AuthorsLim, Andy Eu-JinAuthor
Fang, Wei-WeiAuthor
Liu, FangyueAuthor
Lee, Rinus Tek PoAuthor
Samudra, GaneshAuthor
Kwong, Dim-LeeAuthor
Yeo, Yee-ChiaAuthor
Year2007 (October 22)Volume91
Issue17
PublisherAIP Publishing
DOIdoi:10.1063/1.2803762Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8556901Long-form Identifiermindat:1:5:8556901:8
GUID0
Full ReferenceLim, Andy Eu-Jin, Fang, Wei-Wei, Liu, Fangyue, Lee, Rinus Tek Po, Samudra, Ganesh, Kwong, Dim-Lee, Yeo, Yee-Chia (2007) Impact of interfacial dipole on effective work function of nickel fully silicided gate electrodes formed on rare-earth-based dielectric interlayers. Applied Physics Letters, 91 (17). 172115pp. doi:10.1063/1.2803762
Plain TextLim, Andy Eu-Jin, Fang, Wei-Wei, Liu, Fangyue, Lee, Rinus Tek Po, Samudra, Ganesh, Kwong, Dim-Lee, Yeo, Yee-Chia (2007) Impact of interfacial dipole on effective work function of nickel fully silicided gate electrodes formed on rare-earth-based dielectric interlayers. Applied Physics Letters, 91 (17). 172115pp. doi:10.1063/1.2803762
In(2007, October) Applied Physics Letters Vol. 91 (17) AIP Publishing


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