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Zhang, J. J., Hrauda, N., Groiss, H., Rastelli, A., Stangl, J., Schäffler, F., Schmidt, O. G., Bauer, G. (2010) Strain engineering in Si via closely stacked, site-controlled SiGe islands. Applied Physics Letters, 96 (19). 193101pp. doi:10.1063/1.3425776

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Reference TypeJournal (article/letter/editorial)
TitleStrain engineering in Si via closely stacked, site-controlled SiGe islands
JournalApplied Physics Letters
AuthorsZhang, J. J.Author
Hrauda, N.Author
Groiss, H.Author
Rastelli, A.Author
Stangl, J.Author
Schäffler, F.Author
Schmidt, O. G.Author
Bauer, G.Author
Year2010 (May 10)Volume96
Issue19
PublisherAIP Publishing
DOIdoi:10.1063/1.3425776Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8583312Long-form Identifiermindat:1:5:8583312:6
GUID0
Full ReferenceZhang, J. J., Hrauda, N., Groiss, H., Rastelli, A., Stangl, J., Schäffler, F., Schmidt, O. G., Bauer, G. (2010) Strain engineering in Si via closely stacked, site-controlled SiGe islands. Applied Physics Letters, 96 (19). 193101pp. doi:10.1063/1.3425776
Plain TextZhang, J. J., Hrauda, N., Groiss, H., Rastelli, A., Stangl, J., Schäffler, F., Schmidt, O. G., Bauer, G. (2010) Strain engineering in Si via closely stacked, site-controlled SiGe islands. Applied Physics Letters, 96 (19). 193101pp. doi:10.1063/1.3425776
In(2010, May) Applied Physics Letters Vol. 96 (19) AIP Publishing


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