Zhang, J. J., Hrauda, N., Groiss, H., Rastelli, A., Stangl, J., Schäffler, F., Schmidt, O. G., Bauer, G. (2010) Strain engineering in Si via closely stacked, site-controlled SiGe islands. Applied Physics Letters, 96 (19). 193101pp. doi:10.1063/1.3425776
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Strain engineering in Si via closely stacked, site-controlled SiGe islands | ||
Journal | Applied Physics Letters | ||
Authors | Zhang, J. J. | Author | |
Hrauda, N. | Author | ||
Groiss, H. | Author | ||
Rastelli, A. | Author | ||
Stangl, J. | Author | ||
Schäffler, F. | Author | ||
Schmidt, O. G. | Author | ||
Bauer, G. | Author | ||
Year | 2010 (May 10) | Volume | 96 |
Issue | 19 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.3425776Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8583312 | Long-form Identifier | mindat:1:5:8583312:6 |
GUID | 0 | ||
Full Reference | Zhang, J. J., Hrauda, N., Groiss, H., Rastelli, A., Stangl, J., Schäffler, F., Schmidt, O. G., Bauer, G. (2010) Strain engineering in Si via closely stacked, site-controlled SiGe islands. Applied Physics Letters, 96 (19). 193101pp. doi:10.1063/1.3425776 | ||
Plain Text | Zhang, J. J., Hrauda, N., Groiss, H., Rastelli, A., Stangl, J., Schäffler, F., Schmidt, O. G., Bauer, G. (2010) Strain engineering in Si via closely stacked, site-controlled SiGe islands. Applied Physics Letters, 96 (19). 193101pp. doi:10.1063/1.3425776 | ||
In | (2010, May) Applied Physics Letters Vol. 96 (19) AIP Publishing |
See Also
These are possibly similar items as determined by title/reference text matching only.