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Lwin, Z. Z., Pey, K. L., Zhang, Q., Bosman, M., Liu, Q., Gan, C. L., Singh, P. K., Mahapatra, S. (2012) Study of charge distribution and charge loss in dual-layer metal-nanocrystal-embedded high-κ/SiO2 gate stack. Applied Physics Letters, 100 (19). 193109pp. doi:10.1063/1.4712565

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Reference TypeJournal (article/letter/editorial)
TitleStudy of charge distribution and charge loss in dual-layer metal-nanocrystal-embedded high-κ/SiO2 gate stack
JournalApplied Physics Letters
AuthorsLwin, Z. Z.Author
Pey, K. L.Author
Zhang, Q.Author
Bosman, M.Author
Liu, Q.Author
Gan, C. L.Author
Singh, P. K.Author
Mahapatra, S.Author
Year2012 (May 7)Volume100
Issue19
PublisherAIP Publishing
DOIdoi:10.1063/1.4712565Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8602008Long-form Identifiermindat:1:5:8602008:4
GUID0
Full ReferenceLwin, Z. Z., Pey, K. L., Zhang, Q., Bosman, M., Liu, Q., Gan, C. L., Singh, P. K., Mahapatra, S. (2012) Study of charge distribution and charge loss in dual-layer metal-nanocrystal-embedded high-κ/SiO2 gate stack. Applied Physics Letters, 100 (19). 193109pp. doi:10.1063/1.4712565
Plain TextLwin, Z. Z., Pey, K. L., Zhang, Q., Bosman, M., Liu, Q., Gan, C. L., Singh, P. K., Mahapatra, S. (2012) Study of charge distribution and charge loss in dual-layer metal-nanocrystal-embedded high-κ/SiO2 gate stack. Applied Physics Letters, 100 (19). 193109pp. doi:10.1063/1.4712565
In(2012, May) Applied Physics Letters Vol. 100 (19) AIP Publishing

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Chen, Y. N., Pey, K. L., Goh, K. E. J., Lwin, Z. Z., Singh, P., Mahapatra, S. (2011) Study of automatic recovery on the metal nanocrystal-based Al2O3/SiO2 gate stack. Applied Physics Letters, 98 (8). 83504pp. doi:10.1063/1.3556641
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