Soares, G. V., Feijó, T. O., Baumvol, I. J. R., Aguzzoli, C., Krug, C., Radtke, C. (2014) Thermally-driven H interaction with HfO2 films deposited on Ge(100) and Si(100). Applied Physics Letters, 104 (4). 42901pp. doi:10.1063/1.4862979
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Thermally-driven H interaction with HfO2 films deposited on Ge(100) and Si(100) | ||
Journal | Applied Physics Letters | ||
Authors | Soares, G. V. | Author | |
Feijó, T. O. | Author | ||
Baumvol, I. J. R. | Author | ||
Aguzzoli, C. | Author | ||
Krug, C. | Author | ||
Radtke, C. | Author | ||
Year | 2014 (January 27) | Volume | 104 |
Issue | 4 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.4862979Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8625360 | Long-form Identifier | mindat:1:5:8625360:0 |
GUID | 0 | ||
Full Reference | Soares, G. V., Feijó, T. O., Baumvol, I. J. R., Aguzzoli, C., Krug, C., Radtke, C. (2014) Thermally-driven H interaction with HfO2 films deposited on Ge(100) and Si(100). Applied Physics Letters, 104 (4). 42901pp. doi:10.1063/1.4862979 | ||
Plain Text | Soares, G. V., Feijó, T. O., Baumvol, I. J. R., Aguzzoli, C., Krug, C., Radtke, C. (2014) Thermally-driven H interaction with HfO2 films deposited on Ge(100) and Si(100). Applied Physics Letters, 104 (4). 42901pp. doi:10.1063/1.4862979 | ||
In | (2014, January) Applied Physics Letters Vol. 104 (4) AIP Publishing |
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