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Sekar, K, Sundaravel, B, Wilson, I.H, Heiland, W (2000) Scanning tunneling microscopy and ion channeling studies of thin Co films on bromine-treated Si(100) surfaces. Applied Surface Science, 156. 161-168 doi:10.1016/s0169-4332(99)00504-8

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Reference TypeJournal (article/letter/editorial)
TitleScanning tunneling microscopy and ion channeling studies of thin Co films on bromine-treated Si(100) surfaces
JournalApplied Surface Science
AuthorsSekar, KAuthor
Sundaravel, BAuthor
Wilson, I.HAuthor
Heiland, WAuthor
Year2000 (February)Volume156
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(99)00504-8Search in ResearchGate
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Mindat Ref. ID9901751Long-form Identifiermindat:1:5:9901751:2
GUID0
Full ReferenceSekar, K, Sundaravel, B, Wilson, I.H, Heiland, W (2000) Scanning tunneling microscopy and ion channeling studies of thin Co films on bromine-treated Si(100) surfaces. Applied Surface Science, 156. 161-168 doi:10.1016/s0169-4332(99)00504-8
Plain TextSekar, K, Sundaravel, B, Wilson, I.H, Heiland, W (2000) Scanning tunneling microscopy and ion channeling studies of thin Co films on bromine-treated Si(100) surfaces. Applied Surface Science, 156. 161-168 doi:10.1016/s0169-4332(99)00504-8
In(n.d.) Applied Surface Science Vol. 156. Elsevier BV

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