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Dai, Wei, Wu, Guosong, Wang, Aiying (2010) Structure and elastic recovery of Cr–C:H films deposited by a reactive magnetron sputtering technique. Applied Surface Science, 257. 244-248 doi:10.1016/j.apsusc.2010.06.076

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Reference TypeJournal (article/letter/editorial)
TitleStructure and elastic recovery of Cr–C:H films deposited by a reactive magnetron sputtering technique
JournalApplied Surface Science
AuthorsDai, WeiAuthor
Wu, GuosongAuthor
Wang, AiyingAuthor
Year2010 (October)Volume257
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2010.06.076Search in ResearchGate
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Mindat Ref. ID9915659Long-form Identifiermindat:1:5:9915659:2
GUID0
Full ReferenceDai, Wei, Wu, Guosong, Wang, Aiying (2010) Structure and elastic recovery of Cr–C:H films deposited by a reactive magnetron sputtering technique. Applied Surface Science, 257. 244-248 doi:10.1016/j.apsusc.2010.06.076
Plain TextDai, Wei, Wu, Guosong, Wang, Aiying (2010) Structure and elastic recovery of Cr–C:H films deposited by a reactive magnetron sputtering technique. Applied Surface Science, 257. 244-248 doi:10.1016/j.apsusc.2010.06.076
In(n.d.) Applied Surface Science Vol. 257. Elsevier BV

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