Girginoudi, D., Tsiarapas, C., Georgoulas, N. (2011) Properties of a-Si:H films deposited by RF magnetron sputtering at 95°C. Applied Surface Science, 257. 3898-3903 doi:10.1016/j.apsusc.2010.11.115
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Properties of a-Si:H films deposited by RF magnetron sputtering at 95°C | ||
| Journal | Applied Surface Science | ||
| Authors | Girginoudi, D. | Author | |
| Tsiarapas, C. | Author | ||
| Georgoulas, N. | Author | ||
| Year | 2011 (February) | Volume | 257 |
| Publisher | Elsevier BV | ||
| DOI | doi:10.1016/j.apsusc.2010.11.115Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 9917343 | Long-form Identifier | mindat:1:5:9917343:8 |
| GUID | 0 | ||
| Full Reference | Girginoudi, D., Tsiarapas, C., Georgoulas, N. (2011) Properties of a-Si:H films deposited by RF magnetron sputtering at 95°C. Applied Surface Science, 257. 3898-3903 doi:10.1016/j.apsusc.2010.11.115 | ||
| Plain Text | Girginoudi, D., Tsiarapas, C., Georgoulas, N. (2011) Properties of a-Si:H films deposited by RF magnetron sputtering at 95°C. Applied Surface Science, 257. 3898-3903 doi:10.1016/j.apsusc.2010.11.115 | ||
| In | (n.d.) Applied Surface Science Vol. 257. Elsevier BV | ||
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