Zhao, W., Steidl, M., Paszuk, A., Brückner, S., Dobrich, A., Supplie, O., Kleinschmidt, P., Hannappel, T. (2017) Analysis of the Si(111) surface prepared in chemical vapor ambient for subsequent III-V heteroepitaxy. Applied Surface Science, 392. 1043-1048 doi:10.1016/j.apsusc.2016.09.081
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Analysis of the Si(111) surface prepared in chemical vapor ambient for subsequent III-V heteroepitaxy | ||
Journal | Applied Surface Science | ||
Authors | Zhao, W. | Author | |
Steidl, M. | Author | ||
Paszuk, A. | Author | ||
Brückner, S. | Author | ||
Dobrich, A. | Author | ||
Supplie, O. | Author | ||
Kleinschmidt, P. | Author | ||
Hannappel, T. | Author | ||
Year | 2017 (January) | Volume | 392 |
Publisher | Elsevier BV | ||
DOI | doi:10.1016/j.apsusc.2016.09.081Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 9929529 | Long-form Identifier | mindat:1:5:9929529:9 |
GUID | 0 | ||
Full Reference | Zhao, W., Steidl, M., Paszuk, A., Brückner, S., Dobrich, A., Supplie, O., Kleinschmidt, P., Hannappel, T. (2017) Analysis of the Si(111) surface prepared in chemical vapor ambient for subsequent III-V heteroepitaxy. Applied Surface Science, 392. 1043-1048 doi:10.1016/j.apsusc.2016.09.081 | ||
Plain Text | Zhao, W., Steidl, M., Paszuk, A., Brückner, S., Dobrich, A., Supplie, O., Kleinschmidt, P., Hannappel, T. (2017) Analysis of the Si(111) surface prepared in chemical vapor ambient for subsequent III-V heteroepitaxy. Applied Surface Science, 392. 1043-1048 doi:10.1016/j.apsusc.2016.09.081 | ||
In | (n.d.) Applied Surface Science Vol. 392. Elsevier BV |
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