Reference Type | Journal (article/letter/editorial) |
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Title | Deep hole trap level of nitrogen-doped ZnSe grown by metalorganic vapor phase epitaxy |
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Journal | Journal of Crystal Growth |
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Authors | Goto, Hideo | Author |
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Takemura, Masaaki | Author |
Ido, Toshiyuki | Author |
Year | 1997 (January) | Volume | 170 |
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Issue | 1 |
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Publisher | Elsevier BV |
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DOI | doi:10.1016/s0022-0248(96)00540-4Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 2831279 | Long-form Identifier | mindat:1:5:2831279:0 |
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GUID | 0 |
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Full Reference | Goto, Hideo, Takemura, Masaaki, Ido, Toshiyuki (1997) Deep hole trap level of nitrogen-doped ZnSe grown by metalorganic vapor phase epitaxy. Journal of Crystal Growth, 170 (1). 510-513 doi:10.1016/s0022-0248(96)00540-4 |
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Plain Text | Goto, Hideo, Takemura, Masaaki, Ido, Toshiyuki (1997) Deep hole trap level of nitrogen-doped ZnSe grown by metalorganic vapor phase epitaxy. Journal of Crystal Growth, 170 (1). 510-513 doi:10.1016/s0022-0248(96)00540-4 |
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In | (1997, January) Journal of Crystal Growth Vol. 170 (1) Elsevier BV |
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