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Larson, Lawrence A., Sakshaug, Mike, Weiner, Wayne (1991) The use of tertiarybutylarsine (TBA) and tertiarybutylphosphine (TBP) as liquid reagents for ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 109-114 doi:10.1016/0168-583x(91)96146-c

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Reference TypeJournal (article/letter/editorial)
TitleThe use of tertiarybutylarsine (TBA) and tertiarybutylphosphine (TBP) as liquid reagents for ion implantation
JournalNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
AuthorsLarson, Lawrence A.Author
Sakshaug, MikeAuthor
Weiner, WayneAuthor
Year1991 (April)Volume55
Issue1
PublisherElsevier BV
DOIdoi:10.1016/0168-583x(91)96146-cSearch in ResearchGate
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Mindat Ref. ID5596259Long-form Identifiermindat:1:5:5596259:1
GUID0
Full ReferenceLarson, Lawrence A., Sakshaug, Mike, Weiner, Wayne (1991) The use of tertiarybutylarsine (TBA) and tertiarybutylphosphine (TBP) as liquid reagents for ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 109-114 doi:10.1016/0168-583x(91)96146-c
Plain TextLarson, Lawrence A., Sakshaug, Mike, Weiner, Wayne (1991) The use of tertiarybutylarsine (TBA) and tertiarybutylphosphine (TBP) as liquid reagents for ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 109-114 doi:10.1016/0168-583x(91)96146-c
In(1991, April) Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms Vol. 55 (1) Elsevier BV

See Also

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Yarling, C.B., Keenan, W.A., Larson, L.A. (1991) The history of uniformity mapping in ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 235-242 doi:10.1016/0168-583x(91)96169-l
Holmes, A.J.T., Proudfoot, G. (1991) Negative-ion sources for ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 323-327 doi:10.1016/0168-583x(91)96186-o
Hill, Chris, Hunt, Peter (1991) Ion implantation in bipolar technology. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 1-8 doi:10.1016/0168-583x(91)96125-5
Cheung, Nathan W. (1991) Plasma immersion ion implantation for ULSI processing. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 811-820 doi:10.1016/0168-583x(91)96285-s
Larson, L.A., Keenan, W.A., Johnson, W.H. (1991) Ion implant standard. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 275-280 doi:10.1016/0168-583x(91)96177-m
Svensson, B.G., Mohadjeri, B. (1991) Isotope effects for ion-implantation profiles in silicon. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 650-654 doi:10.1016/0168-583x(91)96251-f
Seidel, Thomas E. (1991) Implantation in the 1990s. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 17-19 doi:10.1016/0168-583x(91)96127-7
(1991) Editorial Board. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). doi:10.1016/0168-583x(91)96122-2
Vyatkin, A.F., Simonov, V.V., Kholopkin, A.I. (1991) Development of ion implantation equipment in the USSR. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 386-392 doi:10.1016/0168-583x(91)96199-u
Stephens, K.G. (1991) Editorial. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). doi:10.1016/0168-583x(91)96123-3
Küsters, K.H., Mühlhoff, H.M., Cerva, H. (1991) Application of ion implantation in submicron CMOS processes. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 9-16 doi:10.1016/0168-583x(91)96126-6
 
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