McOmber, Janice I., Nair, Rajesh S. (1991) Development of a process to achieve residue-free photoresist removal after high-dose ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 281-286 doi:10.1016/0168-583x(91)96178-n
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Development of a process to achieve residue-free photoresist removal after high-dose ion implantation | ||
Journal | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | ||
Authors | McOmber, Janice I. | Author | |
Nair, Rajesh S. | Author | ||
Year | 1991 (April) | Volume | 55 |
Issue | 1 | ||
Publisher | Elsevier BV | ||
DOI | doi:10.1016/0168-583x(91)96178-nSearch in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 5596323 | Long-form Identifier | mindat:1:5:5596323:5 |
GUID | 0 | ||
Full Reference | McOmber, Janice I., Nair, Rajesh S. (1991) Development of a process to achieve residue-free photoresist removal after high-dose ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 281-286 doi:10.1016/0168-583x(91)96178-n | ||
Plain Text | McOmber, Janice I., Nair, Rajesh S. (1991) Development of a process to achieve residue-free photoresist removal after high-dose ion implantation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 55 (1). 281-286 doi:10.1016/0168-583x(91)96178-n | ||
In | (1991, April) Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms Vol. 55 (1) Elsevier BV |
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