Yang, Y.-J., Ho, W. S., Huang, C.-F., Chang, S. T., Liu, C. W. (2007) Electron mobility enhancement in strained-germanium n-channel metal-oxide-semiconductor field-effect transistors. Applied Physics Letters, 91 (10). 102103pp. doi:10.1063/1.2779845
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Electron mobility enhancement in strained-germanium n-channel metal-oxide-semiconductor field-effect transistors | ||
Journal | Applied Physics Letters | ||
Authors | Yang, Y.-J. | Author | |
Ho, W. S. | Author | ||
Huang, C.-F. | Author | ||
Chang, S. T. | Author | ||
Liu, C. W. | Author | ||
Year | 2007 (September 3) | Volume | 91 |
Issue | 10 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.2779845Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8555784 | Long-form Identifier | mindat:1:5:8555784:6 |
GUID | 0 | ||
Full Reference | Yang, Y.-J., Ho, W. S., Huang, C.-F., Chang, S. T., Liu, C. W. (2007) Electron mobility enhancement in strained-germanium n-channel metal-oxide-semiconductor field-effect transistors. Applied Physics Letters, 91 (10). 102103pp. doi:10.1063/1.2779845 | ||
Plain Text | Yang, Y.-J., Ho, W. S., Huang, C.-F., Chang, S. T., Liu, C. W. (2007) Electron mobility enhancement in strained-germanium n-channel metal-oxide-semiconductor field-effect transistors. Applied Physics Letters, 91 (10). 102103pp. doi:10.1063/1.2779845 | ||
In | (2007, September) Applied Physics Letters Vol. 91 (10) AIP Publishing |
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