Reference Type | Journal (article/letter/editorial) |
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Title | Influence of annealing ambients on ZrSi2 formation |
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Journal | Applied Surface Science |
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Authors | Igarashi, Y. | Author |
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Yamaji, T. | Author |
Nishikawa, S. | Author |
Ohno, S. | Author |
Year | 1990 (January) | Volume | 41 |
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Publisher | Elsevier BV |
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DOI | doi:10.1016/0169-4332(89)90071-8Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 9894941 | Long-form Identifier | mindat:1:5:9894941:8 |
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GUID | 0 |
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Full Reference | Igarashi, Y., Yamaji, T., Nishikawa, S., Ohno, S. (1990) Influence of annealing ambients on ZrSi2 formation. Applied Surface Science, 41. 282-285 doi:10.1016/0169-4332(89)90071-8 |
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Plain Text | Igarashi, Y., Yamaji, T., Nishikawa, S., Ohno, S. (1990) Influence of annealing ambients on ZrSi2 formation. Applied Surface Science, 41. 282-285 doi:10.1016/0169-4332(89)90071-8 |
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In | (n.d.) Applied Surface Science Vol. 41. Elsevier BV |
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