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Kovalgin, A., Holleman, J. (2001) A study of morphology and texture of LPCVD germanium-silicon films. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001306

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Reference TypeJournal (article/letter/editorial)
TitleA study of morphology and texture of LPCVD germanium-silicon films
JournalLe Journal de Physique IV
AuthorsKovalgin, A.Author
Holleman, J.Author
Year2001 (August)Volume11
PublisherEDP Sciences
DOIdoi:10.1051/jp4:2001306Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID10302001Long-form Identifiermindat:1:5:10302001:5
GUID0
Full ReferenceKovalgin, A., Holleman, J. (2001) A study of morphology and texture of LPCVD germanium-silicon films. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001306
Plain TextKovalgin, A., Holleman, J. (2001) A study of morphology and texture of LPCVD germanium-silicon films. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001306
In(n.d.) Le Journal de Physique IV Vol. 11. EDP Sciences

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Isai, G., Kovalgin, A., Holleman, J., Woerlee, P., Wallinga, H. (2001) Room temperature SiO2 films deposited by multipolar ECR PECVD. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001394
Davazoglou, D., Kouvatsos, D. N., Valamontes, E. (2001) Influence of texture on the absorption threshold of LPCVD silicon films. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013129
Bercu, M., Cobianu, C., Modreanu, M., Bercu, B. N. (2001) Characterisation of LPCVD silicon oxynitride films by optical spectroscopy. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013121
ALEXANDROV, S. E., KOVALGIN, A. Y. (1991) REMOTE PLASMA CHEMICAL VAPOUR DEPOSITION OF SILICON NITRIDE FILMS. Le Journal de Physique IV, 2. doi:10.1051/jp4:19912100
Kleps, I., Angelescu, A. (1999) LPCVD amorphous silicon carbide films, properties and microelectronics applications. Le Journal de Physique IV, 9. doi:10.1051/jp4:19998139
Minkina, V. G. (2001) Heat and mass transfer during producing silicon layers by chloride LPCVD process. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001321
Alexandrov, S. E., Chistiakov, V. A. (2001) Kinetics of LPCVD of aluminium nitride films based on pyrolysis of aluminium chloride complex. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001319
Levesque, A., Bouteville, A. (2001) Investigation of the tantalum chlorination with hydrogen chloride for LPCVD tantalum elaboration. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013113
Temple-Boyer, P., de Mauduit, B., Caussat, B., Couderc, J. P. (1999) Correlations between stress and microstructure into LPCVD silicon films. Le Journal de Physique IV, 9. doi:10.1051/jp4:19998138
Alexandrov, S. E., Kriakin, V. A. (2001) Kinetics of LPCVD of gallium nitride and oxynitride films based on pyrolysis of a gallium chloride complex with ammonia GaCl3NH3. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001317
Dollet, A., Caussat, B. (2000) Prediction of LPCVD silicon film structure using combined experimental and numerical analyses. Le Journal de Physique IV, 10. doi:10.1051/jp4:2000201
 
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