Watch the Dallas Symposium LIVE, and fundraiser auction
Ticket proceeds support mindat.org! - click here...
Log InRegister
Quick Links : The Mindat ManualThe Rock H. Currier Digital LibraryMindat Newsletter [Free Download]
Home PageAbout MindatThe Mindat ManualHistory of MindatCopyright StatusWho We AreContact UsAdvertise on Mindat
Donate to MindatCorporate SponsorshipSponsor a PageSponsored PagesMindat AdvertisersAdvertise on Mindat
Learning CenterWhat is a mineral?The most common minerals on earthInformation for EducatorsMindat ArticlesThe ElementsThe Rock H. Currier Digital LibraryGeologic Time
Minerals by PropertiesMinerals by ChemistryAdvanced Locality SearchRandom MineralRandom LocalitySearch by minIDLocalities Near MeSearch ArticlesSearch GlossaryMore Search Options
Search For:
Mineral Name:
Locality Name:
Keyword(s):
 
The Mindat ManualAdd a New PhotoRate PhotosLocality Edit ReportCoordinate Completion ReportAdd Glossary Item
Mining CompaniesStatisticsUsersMineral MuseumsClubs & OrganizationsMineral Shows & EventsThe Mindat DirectoryDevice SettingsThe Mineral Quiz
Photo SearchPhoto GalleriesSearch by ColorNew Photos TodayNew Photos YesterdayMembers' Photo GalleriesPast Photo of the Day GalleryPhotography

Levesque, A., Bouteville, A. (2001) Investigation of the tantalum chlorination with hydrogen chloride for LPCVD tantalum elaboration. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013113

Advanced
   -   Only viewable:
Reference TypeJournal (article/letter/editorial)
TitleInvestigation of the tantalum chlorination with hydrogen chloride for LPCVD tantalum elaboration
JournalLe Journal de Physique IV
AuthorsLevesque, A.Author
Bouteville, A.Author
Year2001 (August)Volume11
PublisherEDP Sciences
DOIdoi:10.1051/jp4:20013113Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID10302020Long-form Identifiermindat:1:5:10302020:6
GUID0
Full ReferenceLevesque, A., Bouteville, A. (2001) Investigation of the tantalum chlorination with hydrogen chloride for LPCVD tantalum elaboration. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013113
Plain TextLevesque, A., Bouteville, A. (2001) Investigation of the tantalum chlorination with hydrogen chloride for LPCVD tantalum elaboration. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013113
In(n.d.) Le Journal de Physique IV Vol. 11. EDP Sciences

See Also

These are possibly similar items as determined by title/reference text matching only.

Levesque, A., Bouteville, A. (2001) Evaluation of corrosion behaviour of tantalum coating obtained by low pressure chemical vapor deposition using electrochemical polarization. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013114
Minkina, V. G. (2001) Heat and mass transfer during producing silicon layers by chloride LPCVD process. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001321
Frénois, S., Munier, E., Feaugas, X., Pilvin, P. (2001) A polycrystalline model for stress-strain behaviour of tantalum at 300 K. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001537
Alexandrov, S. E., Chistiakov, V. A. (2001) Kinetics of LPCVD of aluminium nitride films based on pyrolysis of aluminium chloride complex. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001319
Kovalgin, A., Holleman, J. (2001) A study of morphology and texture of LPCVD germanium-silicon films. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001306
Alexandrov, S. E., Kriakin, V. A. (2001) Kinetics of LPCVD of gallium nitride and oxynitride films based on pyrolysis of a gallium chloride complex with ammonia GaCl3NH3. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001317
Vecchio, K. S. (1994) High-strain, high-strain-rate deformation of tantalum and tantalum-tungsten alloys. Le Journal de Physique IV, 4. doi:10.1051/jp4:1994845
KERN, W., CHEN, A., SANDLER, N. (1991) MOCVD OF TANTALUM PENTOXIDE FOR LARGE-AREA ULSI CIRCUIT WAFERS. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991238
Rousset, B., Furgal, L., Fadel, P., Fulop, A., Pujos, D., Temple-Boyer, P. (2001) Development of SiNx LPCVD processes for microtechnological applications. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013117
Marquis, F. D.S., Chen, Y. J. (1997) High-Strain, High-Strain-Rate Deformation Behavior of Tantalum and Tantalum-Tungsten Based Alloys. Le Journal de Physique IV, 7. doi:10.1051/jp4:1997376
Davazoglou, D., Kouvatsos, D. N., Valamontes, E. (2001) Influence of texture on the absorption threshold of LPCVD silicon films. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013129
 
and/or  
Mindat.org is an outreach project of the Hudson Institute of Mineralogy, a 501(c)(3) not-for-profit organization.
Copyright © mindat.org and the Hudson Institute of Mineralogy 1993-2025, except where stated. Most political location boundaries are © OpenStreetMap contributors. Mindat.org relies on the contributions of thousands of members and supporters. Founded in 2000 by Jolyon Ralph.
To cite: Ralph, J., Von Bargen, D., Martynov, P., Zhang, J., Que, X., Prabhu, A., Morrison, S. M., Li, W., Chen, W., & Ma, X. (2025). Mindat.org: The open access mineralogy database to accelerate data-intensive geoscience research. American Mineralogist, 110(6), 833–844. doi:10.2138/am-2024-9486.
Privacy Policy - Terms & Conditions - Contact Us / DMCA issues - Report a bug/vulnerability Current server date and time: August 23, 2025 07:26:42
Go to top of page