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Rousset, B., Furgal, L., Fadel, P., Fulop, A., Pujos, D., Temple-Boyer, P. (2001) Development of SiNx LPCVD processes for microtechnological applications. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013117

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Reference TypeJournal (article/letter/editorial)
TitleDevelopment of SiNx LPCVD processes for microtechnological applications
JournalLe Journal de Physique IV
AuthorsRousset, B.Author
Furgal, L.Author
Fadel, P.Author
Fulop, A.Author
Pujos, D.Author
Temple-Boyer, P.Author
Year2001 (August)Volume11
PublisherEDP Sciences
DOIdoi:10.1051/jp4:20013117Search in ResearchGate
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Mindat Ref. ID10302024Long-form Identifiermindat:1:5:10302024:4
GUID0
Full ReferenceRousset, B., Furgal, L., Fadel, P., Fulop, A., Pujos, D., Temple-Boyer, P. (2001) Development of SiNx LPCVD processes for microtechnological applications. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013117
Plain TextRousset, B., Furgal, L., Fadel, P., Fulop, A., Pujos, D., Temple-Boyer, P. (2001) Development of SiNx LPCVD processes for microtechnological applications. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013117
In(n.d.) Le Journal de Physique IV Vol. 11. EDP Sciences

See Also

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Temple-Boyer, P., de Mauduit, B., Caussat, B., Couderc, J. P. (1999) Correlations between stress and microstructure into LPCVD silicon films. Le Journal de Physique IV, 9. doi:10.1051/jp4:19998138
Levesque, A., Bouteville, A. (2001) Investigation of the tantalum chlorination with hydrogen chloride for LPCVD tantalum elaboration. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013113
Kovalgin, A., Holleman, J. (2001) A study of morphology and texture of LPCVD germanium-silicon films. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001306
Carré, B., Salières, P., Le Déroff, L., Merdji, H., Hergott, J.-F., Auguste, T., Monot, P., D'Oliveira, P., Joyeux, D. (2001) Coherence properties of high harmonics and their applications. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001269
Ryklina, E. P. (2001) Some medical applications of thermomechanically treated titanium nickelide. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001898
Davazoglou, D., Kouvatsos, D. N., Valamontes, E. (2001) Influence of texture on the absorption threshold of LPCVD silicon films. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013129
Bijkerk, F. (2001) Development of multilayer coatings and spin-off to XRL applications. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001298
Bercu, M., Cobianu, C., Modreanu, M., Bercu, B. N. (2001) Characterisation of LPCVD silicon oxynitride films by optical spectroscopy. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013121
Potapov, P. L., Ochin, P., Pons, J., Schryvers, D. (2001) Nanoscale inhomogeneities in melt-spun Ni-Al. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001873
Pichat, P. (2001) Purification d'air par photocatalyse hétérogène. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001745
Minkina, V. G. (2001) Heat and mass transfer during producing silicon layers by chloride LPCVD process. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001321
 
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