Oshima, Masaharu (1981) Optical Spectroscopy in Reactive Sputter Etching and Its Application to Process Control. Japanese Journal of Applied Physics, 20 (4) 683-690 doi:10.1143/jjap.20.683
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Optical Spectroscopy in Reactive Sputter Etching and Its Application to Process Control | ||
| Journal | Japanese Journal of Applied Physics | ||
| Authors | Oshima, Masaharu | Author | |
| Year | 1981 (April) | Volume | 20 |
| Issue | 4 | ||
| Publisher | Japan Society of Applied Physics | ||
| DOI | doi:10.1143/jjap.20.683Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 14984914 | Long-form Identifier | mindat:1:5:14984914:4 |
| GUID | 0 | ||
| Full Reference | Oshima, Masaharu (1981) Optical Spectroscopy in Reactive Sputter Etching and Its Application to Process Control. Japanese Journal of Applied Physics, 20 (4) 683-690 doi:10.1143/jjap.20.683 | ||
| Plain Text | Oshima, Masaharu (1981) Optical Spectroscopy in Reactive Sputter Etching and Its Application to Process Control. Japanese Journal of Applied Physics, 20 (4) 683-690 doi:10.1143/jjap.20.683 | ||
| In | (1981, April) Japanese Journal of Applied Physics Vol. 20 (4) Japan Society of Applied Physics | ||
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