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(1981, April) Japanese Journal of Applied Physics Vol. 20 (4) Japan Society of Applied Physics

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Reference TypeJournal (issue)
JournalJapanese Journal of Applied Physics
Year1981 (April)Volume20
Issue<   4   >
PublisherJapan Society of Applied Physics
Mindat Ref. ID14984915Long-form Identifiermindat:1:5:14984915:1
GUID0
Full Reference(1981, April) Japanese Journal of Applied Physics Vol. 20 (4) Japan Society of Applied Physics
Plain Text(1981, April) Japanese Journal of Applied Physics Vol. 20 (4) Japan Society of Applied Physics
In(1981) Japanese Journal of Applied Physics Vol. 20. Japan Society of Applied Physics

Contains

Oe, Kunishige, Ando, Seigo, Sugiyama, Koichi (1981) InSb1-xBixFilms Grown by Molecular Beam Epitaxy. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l303
Yamanaka, Kazusuke (1981) The Electrochromic Properties of Thermally Decomposed Films of an Organic Tungsten Compound. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l307
Kawamura, Yasuaki, Okano, Koji, Iwayanagi, Shigeo (1981) Ultrasonic Shear Mechanical Impedance of Smectic-A Liquid Crystals. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l309
Takahei, Kenichiro, Nagai, Haruo (1981) Instability of In-Ga-As-P Liquid Solution during Low Temperature LPE of In1-xGaxAs1-yPyon InP. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l313
Hiyamizu, Satoshi, Mimura, Takashi, Fujii, Toshio, Nanbu, Kazuo, Hashimoto, Hisao (1981) Extremely High Mobility of Two-Dimensional Electron Gas in Selectively Doped GaAs/N-AlGaAs Heterojunction Structures Grown by MBE. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l245
Kobayashi, Yutaka, Suzuki, Takaya, Tamura, Masao (1981) Improvement of Crystalline Quality of SOS with Laser Irradiation Techniques. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l249
Susa, Nobuhiko, Yamauchi, Yoshiharu, Kanbe, Hiroshi (1981) Continuous Growth of High Purity InP/InGaAs on InP Substrate by Vapor Phase Epitaxy. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l253
Noguchi, Takashi, Morita, Seizo, Imai, Syozo, Takeuti, Yosihisa, Mikoshiba, Nobuo (1981) Frequency Dependence of the ac Josephson Effect in Nb Point Contacts in the Submillimeter-Wave Region. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l257
Grigaitis, P., Pranevi\ucius, L. (1981) Characteristics of the Relief Patterns in Ion-Beam Lithography. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l261
Inukai, Takashi, Murakami, Toshiaki, Inamura, Takahiro (1981) Li-Ti-O Superconducting Compounds Prepared by Hot-Pressing. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l264
Fujii, G., Ranney, M. A., Clark, A. F. (1981) Thermal Expansion Multifilamentary Nb3Sn and V3Ga Superconductive Cables and Fiberglass-Epoxy and Cotton-Phenolic Composite Materials. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l267
Suzuki, Carlos Kenichi, Doi, Kenji, Kohra, Kazutake (1981) Small Angle and Very-Small Angle X-Ray Scattering from Amorphous Pd80Si20before and after Cold Work. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l271
Yamashita, Kazuhiko (1981) Maximum DC Josephson Current in Magnetic Superconductors. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l275
Fujisawa, Kazuo, Ohmae, Yoshinobu, Shiota, Fuyuhiko (1981) Phenomenological Explanations for the Unbiased Operation of Even-Harmonic Josephson Junction Mixers. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l279
Sasaki, Akio, Kuzuhara, Masaaki (1981) InGaAsP-InP Heterojunction Phototransistors and Light Amplifiers. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l283
Itoh, Sanae-Inoue, Itoh, Kimitaka (1981) Spinning Plasma Ring and Tilting Instability. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l287
Yoshino, Junji, Iwamoto, Takashi, Kukimoto, Hiroshi (1981) Organometallic Vapor Phase Epitaxial Growth of In1-xGaxP (x∼0.5) on GaAs. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l290
Munakata, Chusuke, Miyazaki, Masaru (1981) A Novel Method of Electron Beam Recording on a Si Wafer. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l293
Oikawa, Masahiro, Iga, Kenichi, Sanada, Takeshi, Yamamoto, Noboru, Nishizawa, Kouichi (1981) Array of Distributed-Index Planar Micro-Lenses Prepared from Ion Exchange Technique. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l296
Yamazaki, Ken-ichi, Yamada, Masayoshi, Yamamoto, Keiichi, Abe, Kenji (1981) Anomalous Residual-Stress in Pulsed-Laser-Annealed Silicon-on-Sapphire Revealed by Raman Scattering. Japanese Journal of Applied Physics, 20 (4) doi:10.1143/jjap.20.l299
Oshima, Masaharu (1981) Optical Spectroscopy in Reactive Sputter Etching and Its Application to Process Control. Japanese Journal of Applied Physics, 20 (4) 683-690 doi:10.1143/jjap.20.683
Kato, Kazuo, Ametani, Kazuo, Imai, Masahiko, Seto, Tsuneo (1981) Structural Changes and Melting Behavior of γ-Irradiated Polyethylene. Japanese Journal of Applied Physics, 20 (4) 691-697 doi:10.1143/jjap.20.691
Matsushima, Norio, Akiyama, Morio, Terayama, Yoshio (1981) Quantitative Analysis of Small-Angle X-Ray Scattering of Bone: Determination of Sizes of Its Collagen and Apatite Components. Japanese Journal of Applied Physics, 20 (4) 699-702 doi:10.1143/jjap.20.699
Tabe, Michiharu, Arai, Kunihiro, Nakamura, Hiroaki (1981) Effect of Growth Temperature on Si MBE Film. Japanese Journal of Applied Physics, 20 (4) 703-708 doi:10.1143/jjap.20.703
Kawachi, Masao, Sudo, Shoichi, Edahiro, Takao (1981) Threshold Gas Flow Rate of Halide Materials for the Formation of Oxide Particles in the VAD Process for Optical Fiber Fabrication. Japanese Journal of Applied Physics, 20 (4) 709-712 doi:10.1143/jjap.20.709
Mizuguchi, Jin (1981) Effect of Oxygen and Hydrogen on Transient Photocurrents in Evaporated Thin Films of β-Copperphthalocyanine. Japanese Journal of Applied Physics, 20 (4) 713-719 doi:10.1143/jjap.20.713
Yamamoto, Naoto, Tonomura, Shoichiro, Matsuoka, Tsugufumi, Tsubomura, Hiroshi (1981) The Effect of Reducing Gases on the Conductivities of Metal Oxide Semiconductors. Japanese Journal of Applied Physics, 20 (4) 721-726 doi:10.1143/jjap.20.721
Tsunashima, Shigeru, Mitsuya, Seishiro, Uchiyama, Susumu (1981) Properties of Amorphous Iron-Metalloid Thin Films. Japanese Journal of Applied Physics, 20 (4) 727-731 doi:10.1143/jjap.20.727
Yamada, Syoji, Minakata, Makoto (1981) DC Drift Phenomena in LiNbO3Optical Waveguide Devices. Japanese Journal of Applied Physics, 20 (4) 733-737 doi:10.1143/jjap.20.733
Mizuo, Shoichi, Higuchi, Hisayuki (1981) Retardation of Sb Diffusion in Si during Thermal Oxidation. Japanese Journal of Applied Physics, 20 (4) 739-744 doi:10.1143/jjap.20.739
Fuyuki, Takashi, Matsunami, Hiroyuki (1981) Analysis of Electron Beam Induced Current Considering Sample Dimensions–Measurement of Diffusion Length and Surface Recombination Velocity–. Japanese Journal of Applied Physics, 20 (4) 745-751 doi:10.1143/jjap.20.745
Suzuki, Kazuo, Kim, Pil Hyon, Namba, Susumu (1981) Isotope Scrambling Mechanisms of Chlorine LIS by an Ar Ion Laser Induced Reaction of Cl2with C2Cl4. Japanese Journal of Applied Physics, 20 (4) 753-762 doi:10.1143/jjap.20.753
Ikuta, Kazunari (1981) Dynamics of the Sun-Mill. Japanese Journal of Applied Physics, 20 (4) 763-768 doi:10.1143/jjap.20.763
Hiraki, Naoji, Nakamura, Kazuo, Nakamura, Yukio, Itoh, Satoshi (1981) Temporal Evolutions of Electron Temperature and Density of Turbulently-Heated Tokamak Plasmas in TRIAM-1. Japanese Journal of Applied Physics, 20 (4) 769-773 doi:10.1143/jjap.20.769
Okada, Ikuo, Yoshihara, Hideo (1981) Preparation of MnBi by Enhanced Activated Reactive Evaporation Process. Japanese Journal of Applied Physics, 20 (4) 775-776 doi:10.1143/jjap.20.775
Morisaki, Hiroshi, Ono, Hiroshi, Dohkoshi, Hitoshi, Yazawa, Kazuhiko, Hiraki, Akio, Iwami, Motohiro, Imura, Takeshi (1981) Auger and X-Ray Analyses of Iron-Oxide-Coated Si Photoelectrodes. Japanese Journal of Applied Physics, 20 (4) 777-778 doi:10.1143/jjap.20.777
Shinohara, Koji, Ito, Michiharu, Fukuda, Hirokazu, Ueda, Ryuichi (1981) Homojunction PbS1-xSexDiode Lasers with Reduced Threshold Current Densities. Japanese Journal of Applied Physics, 20 (4) 779-780 doi:10.1143/jjap.20.779
Hibino, Michio, Kuzuya, Mikio, Maruse, Susumu (1981) Correction of the Spherical Aberration of the Objective Lens in a Conventional Transmission Electron Microscope by Means of a Foil Lens. Japanese Journal of Applied Physics, 20 (4) 781-782 doi:10.1143/jjap.20.781
Hisatake, Keizo, Jordão, Jose A. R. (1981) Temporal Instability of Permeability in Manganese Zinc Ferrite. Japanese Journal of Applied Physics, 20 (4) 783-784 doi:10.1143/jjap.20.783
Furuya, Yoshio, Hirose, Masami, Taneda, Youji (1981) Growth of SnO2Single Crystals by Vapour-Phase Reaction. Japanese Journal of Applied Physics, 20 (4) 785-786 doi:10.1143/jjap.20.785
Chiba, Muneo, Okuyama, Katsuro, Kumagai, Yasuji (1981) Recrystallization of Te Films by Hot-Wire Zone-Melting. Japanese Journal of Applied Physics, 20 (4) 787-788 doi:10.1143/jjap.20.787
Watanabe, Hideo, Kao, Kwan C. (1981) Analysis of Composition of a-Si1-xGexAlloy Films. Japanese Journal of Applied Physics, 20 (4) 789-790 doi:10.1143/jjap.20.789
Mizuo, Shoichi, Higuchi, Hisayuki (1981) Anomalous Phosphorus Diffusion in Si Directly Masked with Si3N4Films. Japanese Journal of Applied Physics, 20 (4) 791-792 doi:10.1143/jjap.20.791
Nagai, Haruo (1981) Dislocation Velocities in Indium Phosphide. Japanese Journal of Applied Physics, 20 (4) 793-794 doi:10.1143/jjap.20.793
Jeong, Manu, Shirafuji, Junji, Inuishi, Yoshio (1981) Electron-Irradiation Effect on Emission Band Associated with Carbon Acceptors in n-GaAs. Japanese Journal of Applied Physics, 20 (4) 795-796 doi:10.1143/jjap.20.795
Ito, Atsuko, Torikai, Eiko, Morimoto, Setsu, Shiiki, Kazuo, Kudo, Mitsuhiro (1981) Note on the Directional Distribution of the Magnetization Axis in Amorphous (Co0.94Fe0.06)74.5Si13.5B12Alloy: Mössbauer Study. Japanese Journal of Applied Physics, 20 (4) 797-798 doi:10.1143/jjap.20.797
Sugai, Isao, Kato, Hajime (1981) A New Technique for Preparing Self-Supporting Magnesium Isotope Targets of High Purity. Japanese Journal of Applied Physics, 20 (4) 799-800 doi:10.1143/jjap.20.799
Ookubo, Norio, Hayakawa, Reinosuke, Wada, Yasaku (1981) Effect of Cell Window Birefringence in Dynamic Electric Birefringence Measurement. Japanese Journal of Applied Physics, 20 (4) 801-802 doi:10.1143/jjap.20.801
Horiike, Yasuhiro, Sugawara, Takuji, Okano, Haruo, Shibagaki, Masahiro, Ueda, Yoshiya (1981) Cl2/Ar Plasma Etching of a Contaminated Layer on Si Induced by Fluorocarbon Gas Plasma. Japanese Journal of Applied Physics, 20 (4) 803-804 doi:10.1143/jjap.20.803

See Also

These are possibly similar items as determined by title/reference text matching only.

(1965, April) Japanese Journal of Applied Physics Vol. 4 (4) Japan Society of Applied Physics
(1981, January) Japanese Journal of Applied Physics Vol. 20 (1) Japan Society of Applied Physics
(1981, October) Japanese Journal of Applied Physics Vol. 20 (10) Japan Society of Applied Physics
(1981, November) Japanese Journal of Applied Physics Vol. 20 (11) Japan Society of Applied Physics
(1981, December) Japanese Journal of Applied Physics Vol. 20 (12) Japan Society of Applied Physics
(1981, February) Japanese Journal of Applied Physics Vol. 20 (2) Japan Society of Applied Physics
(1981, March) Japanese Journal of Applied Physics Vol. 20 (3) Japan Society of Applied Physics
(1981, May) Japanese Journal of Applied Physics Vol. 20 (5) Japan Society of Applied Physics
(1981, June) Japanese Journal of Applied Physics Vol. 20 (6) Japan Society of Applied Physics
(1981, July) Japanese Journal of Applied Physics Vol. 20 (7) Japan Society of Applied Physics
(1981, August) Japanese Journal of Applied Physics Vol. 20 (8) Japan Society of Applied Physics
 
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