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Futatsuki, Takashi, Oe, Taro, Aoki, Hidemitsu, Komatsu, Naoyoshi, Kimura, Chiharu, Sugino, Takashi (2010) Low-temperature oxidation of SiC surfaces by supercritical water oxidation. Applied Surface Science, 256. 6512-6517 doi:10.1016/j.apsusc.2010.04.039

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Reference TypeJournal (article/letter/editorial)
TitleLow-temperature oxidation of SiC surfaces by supercritical water oxidation
JournalApplied Surface Science
AuthorsFutatsuki, TakashiAuthor
Oe, TaroAuthor
Aoki, HidemitsuAuthor
Komatsu, NaoyoshiAuthor
Kimura, ChiharuAuthor
Sugino, TakashiAuthor
Year2010 (September)Volume256
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2010.04.039Search in ResearchGate
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Mindat Ref. ID9914946Long-form Identifiermindat:1:5:9914946:8
GUID0
Full ReferenceFutatsuki, Takashi, Oe, Taro, Aoki, Hidemitsu, Komatsu, Naoyoshi, Kimura, Chiharu, Sugino, Takashi (2010) Low-temperature oxidation of SiC surfaces by supercritical water oxidation. Applied Surface Science, 256. 6512-6517 doi:10.1016/j.apsusc.2010.04.039
Plain TextFutatsuki, Takashi, Oe, Taro, Aoki, Hidemitsu, Komatsu, Naoyoshi, Kimura, Chiharu, Sugino, Takashi (2010) Low-temperature oxidation of SiC surfaces by supercritical water oxidation. Applied Surface Science, 256. 6512-6517 doi:10.1016/j.apsusc.2010.04.039
In(n.d.) Applied Surface Science Vol. 256. Elsevier BV

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