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Komatsu, Naoyoshi, Masumoto, Keiko, Aoki, Hidemitsu, Kimura, Chiharu, Sugino, Takashi (2010) Characterization of Si-added aluminum oxide (AlSiO) films for power devices. Applied Surface Science, 256. 1803-1806 doi:10.1016/j.apsusc.2009.10.009

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Reference TypeJournal (article/letter/editorial)
TitleCharacterization of Si-added aluminum oxide (AlSiO) films for power devices
JournalApplied Surface Science
AuthorsKomatsu, NaoyoshiAuthor
Masumoto, KeikoAuthor
Aoki, HidemitsuAuthor
Kimura, ChiharuAuthor
Sugino, TakashiAuthor
Year2010 (January)Volume256
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2009.10.009Search in ResearchGate
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Mindat Ref. ID9915412Long-form Identifiermindat:1:5:9915412:3
GUID0
Full ReferenceKomatsu, Naoyoshi, Masumoto, Keiko, Aoki, Hidemitsu, Kimura, Chiharu, Sugino, Takashi (2010) Characterization of Si-added aluminum oxide (AlSiO) films for power devices. Applied Surface Science, 256. 1803-1806 doi:10.1016/j.apsusc.2009.10.009
Plain TextKomatsu, Naoyoshi, Masumoto, Keiko, Aoki, Hidemitsu, Kimura, Chiharu, Sugino, Takashi (2010) Characterization of Si-added aluminum oxide (AlSiO) films for power devices. Applied Surface Science, 256. 1803-1806 doi:10.1016/j.apsusc.2009.10.009
In(n.d.) Applied Surface Science Vol. 256. Elsevier BV

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