Komatsu, Naoyoshi, Satoh, Tomohisa, Honjo, Masatomo, Futatuki, Takashi, Masumoto, Keiko, Kimura, Chiharu, Aoki, Hidemitsu (2011) Influence of inserting AlN between AlSiON and 4H–SiC interface for the MIS structure. Applied Surface Science, 257. 8307-8310 doi:10.1016/j.apsusc.2011.02.107
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Influence of inserting AlN between AlSiON and 4H–SiC interface for the MIS structure | ||
Journal | Applied Surface Science | ||
Authors | Komatsu, Naoyoshi | Author | |
Satoh, Tomohisa | Author | ||
Honjo, Masatomo | Author | ||
Futatuki, Takashi | Author | ||
Masumoto, Keiko | Author | ||
Kimura, Chiharu | Author | ||
Aoki, Hidemitsu | Author | ||
Year | 2011 (August) | Volume | 257 |
Publisher | Elsevier BV | ||
DOI | doi:10.1016/j.apsusc.2011.02.107Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 9916369 | Long-form Identifier | mindat:1:5:9916369:9 |
GUID | 0 | ||
Full Reference | Komatsu, Naoyoshi, Satoh, Tomohisa, Honjo, Masatomo, Futatuki, Takashi, Masumoto, Keiko, Kimura, Chiharu, Aoki, Hidemitsu (2011) Influence of inserting AlN between AlSiON and 4H–SiC interface for the MIS structure. Applied Surface Science, 257. 8307-8310 doi:10.1016/j.apsusc.2011.02.107 | ||
Plain Text | Komatsu, Naoyoshi, Satoh, Tomohisa, Honjo, Masatomo, Futatuki, Takashi, Masumoto, Keiko, Kimura, Chiharu, Aoki, Hidemitsu (2011) Influence of inserting AlN between AlSiON and 4H–SiC interface for the MIS structure. Applied Surface Science, 257. 8307-8310 doi:10.1016/j.apsusc.2011.02.107 | ||
In | (n.d.) Applied Surface Science Vol. 257. Elsevier BV |
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